Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide
| Autor: | Bencher, Christopher, Cheng, Joy Y., Morita, Seiji, Kanno, Masahiro, Yamamoto, Ryousuke, Sasao, Norikatsu, Sugimura, Shinobu |
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| Zdroj: | Proceedings of SPIE; March 2016, Vol. 9777 Issue: 1 p97770K-97770K-8, 879939p |
| Databáze: | Supplemental Index |
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