Design for nanoimprint lithography: total layout refinement utilizing NIL process simulation
| Autor: | Bencher, Christopher, Cheng, Joy Y., Kobayashi, Sachiko, Komori, Motofumi, Ryoichi, Inanami, Yamashita, Kyoji, Mimotogi, Akiko, Im, Ji-Young, Hatano, Masayuki, Kono, Takuya, Maeda, Shimon |
|---|---|
| Zdroj: | Proceedings of SPIE; March 2016, Vol. 9777 Issue: 1 p977708-977708-7 |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|