OPC optimization techniques for enabling the reduction of mismatch between overlay metrology and the device pattern cell
| Autor: | Sanchez, Martha I., Ukraintsev, Vladimir A., Kim, Shinyoung, Park, Chanha, Jun, Jinhyuck, Hwang, Jaehee, Yang, Hyunjo, Oh, Nang-Lyeom, Park, Sean, Park, Chris, Sun, Kyu-Tae, Zhang, Youping, Tuffy, Paul |
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| Zdroj: | Proceedings of SPIE; March 2016, Vol. 9778 Issue: 1 p97781S-97781S-8, 880038p |
| Databáze: | Supplemental Index |
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