Chemical trimming overcoat: an enhancing composition and process for 193nm lithography
| Autor: | Hohle, Christoph K., Younkin, Todd R., Liu, Cong, Rowell, Kevin, Joesten, Lori, Baranowski, Paul, Kaur, Irvinder, Huang, Wanyi, Leonard, JoAnne, Jeong, Hae-Mi, Im, Kwang-Hwyi, Estelle, Tom, Cutler, Charlotte, Pohlers, Gerd, Yin, Wenyan, Fallon, Patricia, Li, Mingqi, Jeon, Hyun, Xu, Cheng Bai, Trefonas, Pete |
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| Zdroj: | Proceedings of SPIE; March 2016, Vol. 9779 Issue: 1 p97791Y-97791Y-10, 9681320p |
| Databáze: | Supplemental Index |
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