| Autor: |
Liu, J.-F., Cruchon-Dupeyrat, S., Garno, J. C., Frommer, J., Liu, G.-Y. |
| Zdroj: |
Nano Letters; September 2002, Vol. 2 Issue: 9 p937-940, 4p |
| Abstrakt: |
Three-dimensional nanostructures can be constructed using scanning probe lithography in combination with selective surface reactions. This letter introduces a successful approach using AFM-based nanografting to produce two-dimensional nanopatterns within self-assembled monolayer resists. These nanopatterns serve as an anchor to construct nanostructures in the third dimension via surface reactions. In this way, the nanometer-scale 2D pattern is transferred to chemically distinct 3D nanostructures. This approach offers the advantages of high spatial precision and selectivity in pattern transfer. |
| Databáze: |
Supplemental Index |
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