| Autor: |
Gruber, Matthias, Hagedorn, Detlev, Eckert, Werner |
| Zdroj: |
Applied Optics; October 2001, Vol. 40 Issue: 28 p5052-5055, 4p |
| Abstrakt: |
A method for aligning a photolithographic mask at the top of a transparent wafer that has a pattern on its bottom side is presented. The method is based on optical self-imaging of special alignment marks and provides submicrometer accuracy. The method is simple and robust and can conveniently be implemented on laboratory mask aligners for contact or proximity printing. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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