Patterned mask inspection technology with Projection Electron Microscope (PEM) technique for 11 nm half-pitch (hp) generation EUV masks
| Autor: | Yoshioka, Nobuyuki, Hirano, Ryoichi, Iida, Susumu, Amano, Tsuyoshi, Watanabe, Hidehiro, Hatakeyama, Masahiro, Murakami, Takeshi, Yoshikawa, Shoji, Suematsu, Kenichi, Terao, Kenji |
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| Zdroj: | Proceedings of SPIE; July 2015, Vol. 9658 Issue: 1 p96580L-96580L-8, 869229p |
| Databáze: | Supplemental Index |
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