Raman scattering from small particle size polycrystalline silicon
| Autor: | Iqbal, Z., Vepřek, S., Webb, A.P., Capezzuto, P. |
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| Zdroj: | Solid State Communications; March 1981, Vol. 37 Issue: 12 p993-996, 4p |
| Abstrakt: | Raman scattering measurements are reported on polycrystalline silicon films prepared in a hydrogen plasma at temperatures between 70 and 400°C. The spectra show several features which are correlated with X-ray diffraction measurements and assigned to crystalline and amorphous-like components. |
| Databáze: | Supplemental Index |
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