| Autor: |
Derst, G., Kalbitzer, S., Krötz, G., Müller, G. |
| Zdroj: |
Materials Science and Engineering B: Solid-State Materials for Advanced Technology; January 1992, Vol. 11 Issue: 1-4 p79-82, 4p |
| Abstrakt: |
Thin crystalline films of SiC have been produced by ion beam modification of heteroepitaxial silicon thin films on sapphire and by plasma-enhanced chemical vapour deposition on crystalline silicon and sapphire substrates. Both methods yield highly transparent crystalline material. The preparation procedures and the optical properties of these materials are described and applications to optical lithography are pointed out. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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