Ready for multi-beam exposure at 5kV on MAPPER tool: lithographic and process integration performances of advanced resists/stack
| Autor: | Resnick, Douglas J., Bencher, Christopher, Servin, Isabelle, Thiam, Ndeye Arame, Pimenta-Barros, Patricia, Pourteau, Marie-Line, Mebiene, Armel-Petit, Jussot, Julien, Pradelles, Jonathan, Essomba, Philippe, Lattard, Ludovic, Brandt, Pieter, Wieland, Marco |
|---|---|
| Zdroj: | Proceedings of SPIE; March 2015, Vol. 9423 Issue: 1 p94231C-94231C-12, 9328882p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|