Imprint directed self-assembly of cylinder-forming Si-containing block copolymer for 6nm half-pitch line patterning
| Autor: | Resnick, Douglas J., Bencher, Christopher, Xiao, Shuaigang, Yang, XiaoMin, Hsu, Yautzong, Lee, Kim Y., Kuo, David |
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| Zdroj: | Proceedings of SPIE; March 2015, Vol. 9423 Issue: 1 p94230O-94230O-12, 9328783p |
| Databáze: | Supplemental Index |
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