Properties of SiOxNy films deposited by LPCVD from SiH4/N2O/NH3 gaseous mixture

Autor: Temple-Boyer, P., Hajji, B., Alay, J. L., Morante, J. R., Martinez, A.
Zdroj: Sensors and Actuators A: Physical; 1999, Vol. 74 Issue: 1 p52-55, 4p
Databáze: Supplemental Index