A model for low pressure chemical vapor deposition in a hot-wall tubular reactor
| Autor: | Houf, W. G., Grcar, J. F., Breiland, W. G. |
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| Zdroj: | Materials Science and Engineering B: Solid-State Materials for Advanced Technology; 1993, Vol. 17 Issue: 1 p163-163, 1p |
| Databáze: | Supplemental Index |
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