Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs
Autor: | Andresen, Bjørn F., Fulop, Gabor F., Hanson, Charles M., Norton, Paul R., Seok, Chulkyun, Choi, Minkyung, Yang, In-Sang, Park, Sehun, Park, Yongjo, Yoon, Euijoon |
---|---|
Zdroj: | Proceedings of SPIE; July 2014, Vol. 9070 Issue: 1 p907018-907018-6 |
Databáze: | Supplemental Index |
Externí odkaz: |