Multi-step plasma etching process for development of highly photosensitive InSb mid-IR FPAs

Autor: Andresen, Bjørn F., Fulop, Gabor F., Hanson, Charles M., Norton, Paul R., Seok, Chulkyun, Choi, Minkyung, Yang, In-Sang, Park, Sehun, Park, Yongjo, Yoon, Euijoon
Zdroj: Proceedings of SPIE; July 2014, Vol. 9070 Issue: 1 p907018-907018-6
Databáze: Supplemental Index