Evaluation of EUV resist performance below 20nm CD using helium ion lithography
| Autor: | Wood, Obert R., Panning, Eric M., Maas, Diederik, van Veldhoven, Emile, van Langen–Suurling, Anja, Alkemade, Paul F.A., Wuister, Sander, Hoefnagels, Rik, Verspaget, Coen, Meessen, Jeroen, Fliervoet, Timon |
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| Zdroj: | Proceedings of SPIE; April 2014, Vol. 9048 Issue: 1 p90482Z-90482Z-9, 814348p |
| Databáze: | Supplemental Index |
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