Lithography focus/exposure control and corrections to improve CDU at post etch step
| Autor: | Cain, Jason P., Sanchez, Martha I., Kim, Young Ki, Yelverton, Mark, Tristan, John, Lee, Joungchel, Gutjahr, Karsten, Hsu, Ching-Hsiang, Wei, Hong, Wang, Lester, Li, Chen, Subramany, Lokesh, Chung, Woong Jae, Kim, Jeong Soo, Ramanathan, Vidya, Yap, LipKong, Gao, Jie, Karur-Shanmugam, Ram, Golotsvan, Anna, Herrera, Pedro, Huang, Kevin, Pierson, Bill |
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| Zdroj: | Proceedings of SPIE; April 2014, Vol. 9050 Issue: 1 p90501Y-90501Y-9, 814519p |
| Databáze: | Supplemental Index |
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