Integrated ADI optical metrology solution for lithography process control of CD and OV

Autor: Cain, Jason P., Sanchez, Martha I., Strobl, Marlene, Tsai, Wilhelm, Lan, Andy, Chen, Tom, Hsu, Wilson, Chen, Henry, Liang, Frida, Wang, Alan, Hung, Platt, Huang, David, Chiu, Ethan, Yu, Paul, Song, Yi, Yuan, Sylvia, Dirks, Remco, Wright, Noelle, Ponomarenko, Mariya, Cramer, Hugo, Wisse, Baukje, Couraudon, Vincent, Rajasekharan, Bijoy, Plug, Reinder, Kruijswijk, Stefan, Niesing, Henk
Zdroj: Proceedings of SPIE; April 2014, Vol. 9050 Issue: 1 p90501J-90501J-10, 8959610p
Databáze: Supplemental Index