Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography
| Autor: | Lai, Kafai, Erdmann, Andreas, Burdt, R., Thornes, J., Duffey, T., Bibby, T., Rokitski, R., Mason, E., Melchior, J., Aggarwal, T., Haran, D., Wang, J., Rechtsteiner, G., Haviland, M., Brown, D. |
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| Zdroj: | Proceedings of SPIE; April 2014, Vol. 9052 Issue: 1 p90522K-90522K-7, 814706p |
| Databáze: | Supplemental Index |
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