Immersion lithography extension to sub-10nm nodes with multiple patterning
| Autor: | Lai, Kafai, Erdmann, Andreas, Owa, Soichi, Wakamoto, Shinji, Murayama, Masayuki, Yaegashi, Hidetami, Oyama, Kenichi |
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| Zdroj: | Proceedings of SPIE; April 2014, Vol. 9052 Issue: 1 p90520O-90520O-9, 814690p |
| Databáze: | Supplemental Index |
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