Directed self-assembly of PS-b-PDMS into 193nm photoresist patterns and transfer into silicon by plasma etching
| Autor: | Oehrlein, Gottlieb S., Lin, Qinghuang, Zhang, Ying, Archambault, Sophie, Girardot, Cécile, Salaün, Mathieu, Delalande, Michael, Böhme, Sophie, Cunge, Gilles, Pargon, Erwine, Joubert, Olivier, Zelsmann, Marc |
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| Zdroj: | Proceedings of SPIE; March 2014, Vol. 9054 Issue: 1 p90540O-90540O-8, 814869p |
| Databáze: | Supplemental Index |
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