Microstructuring of resist double layers by a femtosecond laser ablation and UV lithography hybrid process
| Autor: | Klotzbach, Udo, Washio, Kunihiko, Arnold, Craig B., Pacher, Tamara, Prinz, Adrian, Stroj, Sandra, Partel, Stefan |
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| Zdroj: | Proceedings of SPIE; March 2014, Vol. 8968 Issue: 1 p89680O-89680O-8, 807129p |
| Databáze: | Supplemental Index |
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