Your worst nightmare: inspection of aggressive OPC on 14nm masks with emphasis on defect sensitivity and wafer defect print predictability
| Autor: | Faure, Thomas B., Ackmann, Paul W., Badger, Karen D., Hibbs, Michael, Rankin, Jed, Seki, Kazunori, Stobert, Ian, Dechene, Daniel J., Bleiman, Ben, Ghosal, Mini, Broadbent, William, Redding, Vincent |
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| Zdroj: | Proceedings of SPIE; September 2013, Vol. 8880 Issue: 1 p88800E-88800E-18, 8791219p |
| Databáze: | Supplemental Index |
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