Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip

Autor: Tong, William M., Resnick, Douglas J., Gubiotti, Thomas, Sun, Jeff Fuge, Freed, Regina, Kidwingira, Francoise, Yang, Jason, Bevis, Chris, Carroll, Allen, Brodie, Alan, Tong, William M., Lin, Shy-Jay, Wang, Wen-Chuan, Haspeslagh, Luc, Vereecke, Bart
Zdroj: Proceedings of SPIE; March 2013, Vol. 8680 Issue: 1 p86800H-86800H-11, 8593212p
Databáze: Supplemental Index