Application of phase shift focus monitor in EUVL process control

Autor: Naulleau, Patrick P., Sun, Lei, Raghunathan, Sudhar, Jindal, Vibhu, Gullikson, Eric, Mangat, Pawitter, Mochi, Iacopo, Goldberg, Kenneth A., Benk, Markus P., Kritsun, Oleg, Wallow, Tom, Civay, Deniz, Wood, Obert
Zdroj: Proceedings of SPIE; April 2013, Vol. 8679 Issue: 1 p86790T-86790T-12, 8592223p
Databáze: Supplemental Index