Effect of leaving group design on EUV lithography performance
| Autor: | Naulleau, Patrick P., Ongayi, Owendi, Jain, Vipul, Coley, Suzanne M., Valeri, David, Kwok, Amy, Quach, Dung, Wagner, Mike, Cameron, Jim, Thackeray, Jim |
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| Zdroj: | Proceedings of SPIE; April 2013, Vol. 8679 Issue: 1 p867907-867907-11 |
| Databáze: | Supplemental Index |
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