Role of 3D photo-resist simulation for advanced technology nodes
| Autor: | Conley, Will, Narayana Samy, Aravind, Seltmann, Rolf, Kahlenberg, Frank, Schramm, Jessy, Küchler, Bernd, Klostermann, Ulrich |
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| Zdroj: | Proceedings of SPIE; April 2013, Vol. 8683 Issue: 1 p86831E-86831E-9, 781489p |
| Databáze: | Supplemental Index |
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