Lithography focus/exposure control and corrections to improve CDU
Autor: | Starikov, Alexander, Cain, Jason P., Kim, Young Ki, Yelverton, Mark, Lee, Joungchel, Cheng, Jerry, Wei, Hong, Kim, Jeong Soo, Gutjahr, Karsten, Gao, Jie, Karur-Shanmugam, Ram, Herrera, Pedro, Huang, Kevin, Volkovich, Roie, Pierson, Bill |
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Zdroj: | Proceedings of SPIE; April 2013, Vol. 8681 Issue: 1 p86811P-86811P-8, 781308p |
Databáze: | Supplemental Index |
Externí odkaz: |