On-product overlay enhancement using advanced litho-cluster control based on integrated metrology, ultra-small DBO targets and novel corrections

Autor: Starikov, Alexander, Cain, Jason P., Bhattacharyya, Kaustuve, Ke, Chih-Ming, Huang, Guo-Tsai, Chen, Kai-Hsiung, Smilde, Henk-Jan H., Fuchs, Andreas, Jak, Martin, van Schijndel, Mark, Bozkurt, Murat, van der Schaar, Maurits, Meyer, Steffen, Un, Miranda, Morgan, Stephen, Wu, Jon, Tsai, Vincent, Liang, Frida, den Boef, Arie, ten Berge, Peter, Kubis, Michael, Wang, Cathy, Fouquet, Christophe, Terng, L. G., Hwang, David, Cheng, Kevin, Gau, TS, Ku, Y. C.
Zdroj: Proceedings of SPIE; April 2013, Vol. 8681 Issue: 1 p868104-868104-9
Databáze: Supplemental Index