Advanced mask aligner lithography (AMALITH)

Autor: von Freymann, Georg, Schoenfeld, Winston V., Rumpf, Raymond C., Dunbar, L. A., Bergonzi, G., Vogler, U., Angeloni, S., Kirner, R., Bramati, A., Timotijevic, B., Voelkel, R., Stanley, R. P.
Zdroj: Proceedings of SPIE; March 2013, Vol. 8613 Issue: 1 p86131D-86131D-7, 775187p
Databáze: Supplemental Index