| Autor: |
Yang, Jian Hua, Ma, Xing Jian, Rong, Lu Fei, Liu, Bo, Yu, Jia Yan, Zhang, Jing |
| Zdroj: |
Advanced Materials Research; August 2013, Vol. 750 Issue: 1 p1987-1991, 5p |
| Abstrakt: |
The characterization of surface wear resistance of materials usually relies on the measurement of slight wear. There are two obvious shortcomings for weighing method. In order to improve the measurement accuracy, a more intuitive and reliable method for quantitative measurement of slight wear, interference microscope method, has be given. Higher accuracy (the order of micrometer) can be achieved using the interferometry for the measurement of slight wear. The results show that the masking processing technology can ensure that all samples for wear testing and other analysis are obtained under the same pretreatment conditions and vacuum processing conditions, speed up the commercialization of processing technology, and comparing the cross-sectional areas of wear scars is a correct way to characterize the wear resistance of different zones. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
|
