Ion versus neutral irradiation of thin films of amorphous SiO~2: an in situ X-ray photoelectron spectroscopy study
| Autor: | Torrisi, A., Licciardello, A., Ancarani, V., Cantiano, M., Puglisi, O. |
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| Zdroj: | Nuclear Instruments and Methods in Physics Research Section B; 1996, Vol. 116 Issue: 1 p342-346, 5p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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