Monte Carlo study of High performance resists for SCALPEL nanolithography
| Autor: | Ocola, L. E., Li, W. Y., Kasica, R. J., Blakey, M. I., Orphanos, P. A., Waskiewicz, W. K., Novembre, A. E., Sato, M. |
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| Zdroj: | Microelectronic Engineering; 2000, Vol. 53 Issue: 1 p433-436, 4p |
| Databáze: | Supplemental Index |
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