Process development for 30 nm poly gate patterning on 1.2 nm oxide
| Autor: | Heitzmann, M., Nier, M. E. |
|---|---|
| Zdroj: | Microelectronic Engineering; 2000, Vol. 53 Issue: 1 p159-162, 4p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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| Autor: | Heitzmann, M., Nier, M. E. |
|---|---|
| Zdroj: | Microelectronic Engineering; 2000, Vol. 53 Issue: 1 p159-162, 4p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|
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