Anisotropic pattern transfer of fine resist features to silicon nitride via an intermediate titanium layer
| Autor: | Midha, A., Murad, S. K., Weaver, J. M. R. |
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| Zdroj: | Microelectronic Engineering; 1997, Vol. 35 Issue: 1 p99-104, 6p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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