Fabrication of refractive microlenses in semiconductors by mask shape transfer in reactive ion etching

Autor: Strzelecka, E. M., Robinson, G. D., Coldren, L. A., Hu, E. L.
Zdroj: Microelectronic Engineering; 1997, Vol. 35 Issue: 1 p385-388, 4p
Databáze: Supplemental Index