Low resistivity aluminum nitride:carbon (AlN:C) films grown by metal organic chemical vapor deposition
| Autor: | Wongchotigul, K., Chen, N., Zhang, D. P., Tang, X., Spencer, M. G. |
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| Zdroj: | Materials Letters; 1996, Vol. 26 Issue: 4 p223-226, 4p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
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