nm-Co2Si, CoSi and CoSi2 silicide films from the single source precursor CoSiCl3(CO)4 in the presence of SiH4
| Autor: | Prokop, J., Zybill, C.E., Veprek, S. |
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| Zdroj: | Thin Solid Films; 2000, Vol. 359 Issue: 1 p39-45, 7p |
| Databáze: | Supplemental Index |
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