Thick SiO~xN~y and SiO~2 films obtained by PECVD technique at low temperatures
| Autor: | Alayo, M. I., Pereyra, I., o, M. N. P. Carre |
|---|---|
| Zdroj: | Thin Solid Films; 1998, Vol. 332 Issue: 1 p40-45, 6p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|
| Autor: | Alayo, M. I., Pereyra, I., o, M. N. P. Carre |
|---|---|
| Zdroj: | Thin Solid Films; 1998, Vol. 332 Issue: 1 p40-45, 6p |
| Databáze: | Supplemental Index |
| Externí odkaz: |
|
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