| Autor: |
Finders, Jo, Mouraille, O., Bouma, A., Ngai, A., Grim, K., van Praagh, J., Toma, C., Miyazaki, J., Higuchi, M., Kojima, Y., Connolly, B., Englard, I., Cohen, Y., Mangan, S., Ben Yishai, Michael, Jullian, Karine |
| Zdroj: |
Proceedings of SPIE; February 2012, Vol. 8352 Issue: 1 p83520G-83520G-15, 8268496p |
| Abstrakt: |
In this paper we compare the imaging properties of lithographic test structures formed on test masks with different reticle absorbers for use in1.35 NA immersion lithography. We will look into different aspects like process windows and CD fingerprints. Beyond that we look into the topographic effects caused by the different absorbers, the mask 3D effects. We will study the interaction between the different masks and immersion scanner. Special attention is given towards the correctability of the intrafield CD fingerprint by mask and scanner applying dose corrections. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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