| Autor: |
Ramesham, R., Hill, D.C., Best, S.R., Rose, M.F., Askew, R.F., Ayres, V.M. |
| Zdroj: |
Thin Solid Films; 1995, Vol. 257 Issue: 1 p68-71, 4p |
| Abstrakt: |
The microwave plasma-assisted chemical vapor deposition (CVD) technique has been used to grow a polycrystalline diamond thin film over silicon substrate. Reactant gases of methane and hydrogen were used in the diamond CVD process. We have performed a feasibility test on the possible applicability of diamond and diamond-like carbon thin films for space protective applications against artificially simulated hypervelocity impact of micrometeoroid particles of olivine. As-deposited films were analyzed by Raman and scanning electron microscopy for their chemical nature and morphology respectively. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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