Temperature-programmed evolution of low-energy, rare-gas ions implanted in Si(100) [Surface Science 330 (1995) L633-L638]
| Autor: | Tesauro, M. R., Underwood, G., Kellerman, B. K., Campion, A. |
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| Zdroj: | Surface Science; 1995, Vol. 340 Issue: 1 pL997-L997, 1p |
| Databáze: | Supplemental Index |
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