| Autor: |
Fullam, Jennifer, Boye, Carol, Standaert, Theodorus, Gaudiello, John, Tomlinson, Derek, Xiao, Hong, Fang, Wei, Zhang, Xu, Wang, Fei, Ma, Long E., Zhao, Yan, Jau, Jack |
| Zdroj: |
Proceedings of SPIE; March 2011, Vol. 7971 Issue: 1 p79710Y-79710Y-11, 7891302p |
| Abstrakt: |
In this paper, we tested a novel methodology of measuring critical dimension (CD) uniformity, or CDU, with electron beam (e-beam) hotspot inspection and measurement systems developed by Hermes Microvision, Inc. (HMI). The systems were used to take images of two-dimensional (2D) array patterns and measure CDU values in a custom designated fashion. Because this methodology combined imaging of scanning micro scope (SEM) and CD value averaging over a large array pattern of optical CD, or OCD, it can measure CDU of 2D arrays with high accuracy, high repeatability and high throughput. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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