Beam shaping: top hat and customized intensity distributions for semiconductor manufacturing and inspection

Autor: Teipel, Ansgar, Aschke, Lutz
Zdroj: Proceedings of SPIE; March 2011, Vol. 7973 Issue: 1 p797321-797321-15
Abstrakt: Enabling the next technology nodes with optical technologies means further reduced error budgets for optical systems and new optical approaches for higher precision and increased throughput. This contribution discusses important aspects and features of laser beam shaping in optical systems for semiconductor manufacturing and inspection. Beam shaping principles for different types of lasers and illumination requirements are explained.
Databáze: Supplemental Index