| Autor: |
Hoffmann, U., Landgraf, H., Campo, M., Keller, S., Koening, M. |
| Zdroj: |
Proceedings of SPIE; February 2011, Vol. 7954 Issue: 1 p79540Z-79540Z-8, 715869p |
| Abstrakt: |
A new concept of a vertical In-Line deposition machine for large area white OLED production has been developed. The concept targets manufacturing on large substrates (≥ Gen 4, 750 x 920 mm2) using linear deposition source achieving a total material utilization of ≥ 50 % and tact time down to 80 seconds. The continuously improved linear evaporation sources for the organic material achieve thickness uniformity on Gen 4 substrate of better than ± 3 % and stable deposition rates down to less than 0.1 nm m/min and up to more than 100 nm m/min. For Lithium-Fluoride but also for other high evaporation temperature materials like Magnesium or Silver a linear source with uniformity better than ± 3 % has been developed. For Aluminum we integrated a vertical oriented point source using wire feed to achieve high (> 150 nm m/min) and stable deposition rates. The machine concept includes a new vertical vacuum handling and alignment system for Gen 4 shadow masks. A complete alignment cycle for the mask can be done in less than one minute achieving alignment accuracy in the range of several 10 m. |
| Databáze: |
Supplemental Index |
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