| Autor: |
Williams, P. A., Jones, A. C., Wright, P. J., Crosbie, M. J., Bickley, J. F., Steiner, A., Davies, H. O., Leedham, T. J. |
| Zdroj: |
Chemical Vapor Deposition; May 2002, Vol. 8 Issue: 3 p110-116, 7p |
| Abstrakt: |
Thin films of tantalum oxide and niobium oxide have been deposited by liquid injection MOCVD using solutions of Ta(OEt)4(dbm) (1) or Nb(OEt)4(dbm) (2) (dbm = dibenzoyl methanate = 1,3‐diphenyl‐1,3‐propanedionate). The presence of the dbm ligand imparts unusual thermal stability to the complexes, allowing oxide films to be deposited at relatively high substrate temperatures (650 °C and higher). Single‐crystal X‐ray diffraction (XRD) shows the complexes to be mononuclear, with distorted octahedral configurations. |
| Databáze: |
Supplemental Index |
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