| Autor: |
Kang, Yuji, Okada, Makoto, Minari, Chiaki, Kanda, Kazuhiro, Haruyama, Yuichi, Matsui, Shinji |
| Zdroj: |
Japanese Journal of Applied Physics; June 2010, Vol. 49 Issue: 6 p06GL13-06GL15, 3p |
| Abstrakt: |
A new room-temperature imprinting method was developed using liquid-phase hydrogen silsesquioxane (HSQ) with a hard poly(dimethylsiloxane) (h-PDMS) mold. The simultaneous imprinting of arbitrary patterns including both submicron and greater than 100 \mbox{$\mu$m} patterns on a 4-in. wafer were replicated at room-temperature and a low pressure with high throughput, because the solvent in HSQ gradually evaporated through the pores of the h-PDMS mold. A bilayer structure was successfully fabricated using as HSQ pattern as an etching mask without removing the residual layer. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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