Low loss Si_3N_4-SiO_2 optical waveguides on Si

Autor: Henry, C. H., Kazarinov, R. F., Lee, H. J., Orlowsky, K. J., Katz, L. E.
Zdroj: Applied Optics; July 1987, Vol. 26 Issue: 13 p2621-2624, 4p
Abstrakt: We have developed an optical integrated circuit waveguide technology based on conventional Si processing. We demonstrate waveguide losses of <0.3 dB/cm in the 1.3–1.6-µm wavelength range. We use a high refractive-index core of Si_3N_4 surrounded by SiO_2 cladding layers, which provides a highly confined optical mode adequate for butt coupling to channel substrate buried heterostructure lasers. We report the first IR transmission experiments in these waveguides and find two absorption peaks associated with H in SiO_2 and Si_3N_4 layers at 1.40 and 1.52 µm, respectively. The peak absorptions are 2.2 and 1.2 dB/cm, respectively, and these peaks can be largely removed by annealing at 1100–1200°C.
Databáze: Supplemental Index