| Autor: |
Ohshima, Masayuki, Abu Suilik, Saleh B., Tetsui, Toshimitsu, Hasezaki, Kazuhiro |
| Zdroj: |
Materials Science Forum; October 2009, Vol. 631 Issue: 1 p495-500, 6p |
| Abstrakt: |
The NbSi2/Nb/-TiAl and NbSi2/Nb functionally graded materials (FGMs) were prepared and their tolerances tested by exposing them to temperatures from 1050 °C to 1250 °C under vacuum and in air. Oxygen resistivity was estimated from metallographic investigations. The FGM lifetime was estimated by using a diffusion equation that considers the disappearance of the NbSi2 and Nb interlayer. These occurred during NbSi2 oxidation and Si diffusion from NbSi2 to Nb and interdiffusion between Nb and -TiAl. The results were validated by diffusion equations. |
| Databáze: |
Supplemental Index |
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