| Autor: |
Abu Suilik, Saleh B., Ohshima, Masayuki, Tetsui, Toshimitsu, Hasezaki, Kazuhiro |
| Zdroj: |
Materials Science Forum; October 2009, Vol. 631 Issue: 1 p425-430, 6p |
| Abstrakt: |
Several diamond coatings were performed on -TiAl substrates by a microwave-plasma assisted CVD, which were made directly to the substrate and indirectly to the TiC, Ti5Si3, Al2O3+TiO2 and Si layers on the substrate. The direct coatings suffered from severe delamination and cracks. The deposited layers on TiC and Ti5Si3 layers partially delaminated, while those on Al2O3+TiO2 and Si layers adhered well without delamination. All the diamond films deposited were characterized using scanning electron microscopy, Raman spectroscopy, and X-ray diffraction. Raman spectra showed that poly- and nano-crystalline diamond films were obtained for the coatings of -TiAl. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
|
