| Autor: |
Chokwatvikul, C., Surinphong, S., Busabok, C., Termsuksawad, P., Larpkiattaworn, S. |
| Zdroj: |
Advanced Materials Research; January 2010, Vol. 93 Issue: 1 p276-279, 4p |
| Abstrakt: |
Sintered TiAl alloy with composition of 50 at.% Al and 50at.% Ti are used as target in the PVD cathodic arc system to produce (Ti,Al)N film. The coating conditions are operated using substrate bias voltage and arc current bias of 100V and 70 A, respectively. In addition, the coating time was set at 1.30 h with thru different values of nitrogen gas pressures: 1, 1.5and 2 Pa. After coating the film was characterized for thickness, surface roughness, adhesion, morphology, and phase structure. It was found that phase structures, film thicknesses and adhesion of the films deposited from different nitrogen pressures are not significantly different. However, the micrographs showed that the film prepared by using 1.5 Pa of reactive N2 gas is smoother with less droplets than those film prepared at the other two pressures. |
| Databáze: |
Supplemental Index |
| Externí odkaz: |
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